Niki ibikoresho bya sputter

Magnetron sputtering coating nuburyo bushya bwo gutwika imyuka yumubiri, ugereranije nuburyo bwambere bwo gutwika umwuka, ibyiza byayo mubice byinshi biratangaje.Nka tekinoroji ikuze, magnetron sputtering yakoreshejwe mubice byinshi.

　　Ihame rya Magnetron:

Umwanya wa magnetiki ya orthogonal n'umuriro w'amashanyarazi byongewe hagati ya pole igenewe (cathode) na anode, kandi gaze ya inert isabwa (ubusanzwe gaze ya Ar) yuzuzwa mucyumba kinini cya vacuum.Imashini ihoraho ikora magnetiki ya 250-350 ya gaus hejuru yikintu cyerekanwe, kandi imashanyarazi ya orthogonal electromagnetic igizwe numuriro mwinshi w'amashanyarazi.Ingaruka zumuriro wamashanyarazi, Ar gaz ionisiyoneri muri ion nziza na electron, intego kandi ifite umuvuduko mubi, uhereye kumugambi uva kuri pole bitewe numurima wa magnetique hamwe na gazi ikora ya ionisiyonike ishobora kwiyongera, ikora plasma yuzuye cyane hafi ya cathode, Ar ion munsi yingufu za lorentz, kwihuta kuguruka hejuru yintego, gutera ibisasu hejuru yumuvuduko mwinshi, Atome zivanze ku ntego zikurikiza ihame ryo guhinduranya imbaraga hanyuma ziguruka ziva hejuru yintego hamwe na kinetic nyinshi. imbaraga kuri substrate yo kubitsa.

Gukwirakwiza Magnetron muri rusange bigabanijwemo ubwoko bubiri: gusohora DC na RF.Ihame ryibikoresho bya DC byoroshe biroroshye, kandi igipimo cyihuta mugihe gisohora ibyuma.Ikoreshwa rya RF sputtering ni nini cyane, usibye gusohora ibikoresho bitwara, ariko kandi no gusohora ibikoresho bitayobora, ariko kandi no gutegura imyuka ya okiside, nitide na karbide nibindi bikoresho bivanze.Niba inshuro ya RF yiyongera, ihinduka microwave plasma isohoka.Kugeza ubu, electron cyclotron resonance (ECR) ubwoko bwa microwave plasma sputtering ikoreshwa.

　　Ibikoresho bya Magnetron bisohora ibikoresho:

Ibikoresho byo guteramo ibyuma, gutwikisha ibishishwa byifashishwa, ibikoresho bya ceramic sputtering coater, ibikoresho bya boride ceramic sputtering ibikoresho, ibikoresho bya karbide ceramic, ibikoresho bya fluoride ceramic, ibikoresho bya nitride ceramic, ibikoresho bya selenide, ibikoresho bya silicide ceramic sputtering ibikoresho, sulfide ceramic sputtering material material, Telluride ceramic sputtering target, izindi ntego ceramic, chromium-dope silicon oxyde ceramic (CR-SiO), intego ya indium fosifide (InP), intego ya arsenide (PbAs), indium arsenide intego (InAs).